Comparison ledger
Applied Materials 0010-13622 RF Match for, ASM E 2000 Epitaxial Reactor, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | |
|---|---|---|
| OEM | Applied Materials | ASM |
| Category | Deposition | Deposition |
| Wafer size | — | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | ASM E 2000 Epitaxial Reactor |
| Cited variants | — | |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[3] | RP[1] |
| Model | 0010-13622[3] | E 2000[5] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[3] | — |
| Feature | High Efficiency HE RF Match-Bias[3] | — |
| Supply Voltage/ Freq | — | 480/ 50[4] |
| System Hand | — | Left Hand[4] |
| Monitor Type | — | Flat Panel[4] |
| Maint Console | — | Mini Maint[4] |
| CPU | — | 68040[4] |
| Software Version | — | 7.65[4] |
| Comms | — | HSMS[4] |
| RP/ ATM | — | RP[4] |
| Vacuum Load Locks | — | No[4] |
| WHC Gate Valve | — | Swing[4] |
| WHC Robot Arm | — | Wide[4] |
| Reactor Isolation | — | HVA[4] |
| ATM Valve | — | VAT[4] |
| Pressure Controller | — | MKS 152 Analogue[4] |
| PCV Type | — | MKS 253B[4] |
| Choke Valve | — | Yes[4] |
| RP Orientation | — | Bottom Feed[4] |
| Gas Panel Orientation | — | Top Feed[4] |
| Main H2/N2 | — | 100slm[4] |
| Cross Purge Valves | — | Yes[4] |
| Wafer Size | — | 200mm[5] |
| Supply Voltage / Freq | — | 480 / 50[1] |
| HCL Hi | — | 20slm[7] |
| Supply Voltage / Frequency | — | 480 V / 50 Hz[4] |
| Maintenance Console | — | Mini Maint[4] |
| Communications | — | HSMS[4] |
| Main H2/N2 Flow | — | 100 slm[4] |
| Shaft MFC | — | 5 slm[4] |
| P Dopant Loop | — | Yes[4] |
| N Dopant Loop | — | Yes, Teed PH3/AsH3[4] |
| Aux1 Gas (SiH2Cl2) | — | 500 sccm[4] |
| Aux2 Gas (SiH4) | — | 105 sccm[4] |
| HCL High | — | 20 slm (some 30 slm)[4] |
| HCl Low | — | 2000 sccm (some 1000 sccm, 500 sccm)[4] |
| TCS | — | 25 gpm LVC[4] |
| DCS Cabinet | — | Yes[4] |
| TCS Mini Bubbler | — | 10L LPE[4] |
| Gas Detection | — | Gastec H2/HCl[4] |
| Temperature Controller | — | Foxboro[4] |
| Analog Ratio Control | — | Yes[4] |
| Wafer Size Kits Available | — | 100 mm, 150 mm, 200 mm[1] |
| Unit Vintage (example unit) | — | 2001[1] |
| OEM | — | ASM[5] |
| Equipment name | — | ASM E 2000 Epitaxial Reactor[5] |
| Category | — | Deposition[5] |
| Wafer sizes | — | 8 inch[5] |
| Supply voltage / frequency | — | 480 / 50[5] |
| Dep/Vent transition valves | — | Yes[5] |
| ATM/RP vent | — | Yes[5] |
| P loop MFCs Dil/SRC/INJ | — | 20slm/175/175[5] |
| N loop MFCs Dil/SRC/INJ | — | 20slm/175/175[5] |
| Aux1 | — | SiH2Cl2 500sccm[5] |
| Aux2 | — | SiH4 105sccm[5] |
| Aux3 | — | None[5] |
| Aux4 | — | GeH4 2000sccm[5] |
| Aux5 | — | GeH4 175sccm[5] |
| HCl Hi | — | Yes 20slm[5] |
| Precision vent matching | — | Yes[5] |
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