ASM

E 2000 Epitaxial Reactor

Deposition 200mm ASM E 2000 Epitaxial Reactor family

Research Quality: 40% complete

The ASM E 2000 is an epitaxial reactor designed for deposition of epitaxial layers on semiconductor wafers. The E 2000 supports wafer sizes including 100mm, 150mm, and 200mm. The E 2000 uses a 68040 CPU and software version 7.65 for control.^[1]

ASME 2000 Epitaxial Reactor

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Plate 01ASM Epsilon E2000
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Wafer size

200mm

Power

480/ 50^[2]

Vacuum

No^[2]

Performance

Yes^[1]

Gas delivery

Top Feed^[2]

What it is

General reference — not yet source-verified

The ASM E 2000 Epitaxial Reactor is a semiconductor deposition system for epitaxial growth.

How it works

The ASM E 2000 includes a reactor chamber, gas delivery hardware, temperature control, pressure control, and purge and vent plumbing.^[2]^[1]^[3]^[4]^[5]

Where it fits in the process flow

The ASM E 2000 is configured for wafer handling around the reactor with load and unload functions, isolation hardware, and gas-panel routing.^[2]^[1]^[3]^[4]^[5]

Applications

General reference — not yet source-verified

Epitaxial reactors are used to form single-crystal semiconductor layers for device structures that need tight control of thickness, composition, and electrical properties.

What do the numbers mean?

Power & electrical4

Supply Voltage/ Freq: 480/ 50^[2]
Supply Voltage / Freq: 480 / 50^[3]
Supply Voltage / Frequency: 480 V / 50 Hz^[2]
Supply voltage / frequency: 480 / 50^[1]

Vacuum & pumping4

Vacuum Load Locks: No^[2]
Pressure Controller: MKS 152 Analogue^[2]; Vacuum Load Locks^[3]
Vacuum Load Locks: No (some units have Vacuum Load Locks)^[2]

Wafer handling6

WHC Robot Arm: Wide^[2]
Wafer Size: 200mm^[1]
WHC Robot Arm: Wide (some Dual Feed)^[2]
Wafer Size Kits Available: 100 mm, 150 mm, 200 mm^[3]
Wafer Size: 100mm, 150mm, 200mm (8 inch)^[1]
Wafer sizes: 8 inch^[1]

Gas & chemistry6

Gas Panel Orientation: Top Feed^[2]
Shaft MFC: 5 slm^[2]
Aux1 Gas (SiH2Cl2): 500 sccm^[2]
Aux2 Gas (SiH4): 105 sccm^[2]
HCl Low: 2000 sccm (some 1000 sccm, 500 sccm)^[2]
Gas Detection: Gastec H2/HCl^[2]

Performance1

Precision vent matching: Yes^[1]

Control & software3

Software Version: 7.65^[2]
Temperature Controller: Foxboro^[2]
Analog Ratio Control: Yes^[2]

Configuration & options47

System Hand: Left Hand^[2]
Monitor Type: Flat Panel^[2]
Maint Console: Mini Maint^[2]
CPU: 68040^[2]
Comms: HSMS^[2]
RP/ ATM: RP^[2]
WHC Gate Valve: Swing^[2]
Reactor Isolation: HVA^[2]
ATM Valve: VAT^[2]
PCV Type: MKS 253B^[2]
Choke Valve: Yes^[2]
RP Orientation: Bottom Feed^[2]
Main H2/N2: 100slm^[2]
Cross Purge Valves: Yes^[2]; RP^[3]
System Hand: Right Hand^[4]; Choke Valve^[5]
HCL Hi: 20slm^[6]
System Hand: Left Hand (some units Right Hand)^[2]
Maintenance Console: Mini Maint^[2]
Communications: HSMS^[2]
WHC Gate Valve: Swing (some VAT)^[2]
Main H2/N2 Flow: 100 slm^[2]
P Dopant Loop: Yes^[2]
N Dopant Loop: Yes, Teed PH3/AsH3^[2]
HCL High: 20 slm (some 30 slm)^[2]
TCS: 25 gpm LVC^[2]
DCS Cabinet: Yes^[2]
TCS Mini Bubbler: 10L LPE^[2]
Unit Vintage (example unit): 2001^[3]
WHC Gate Valve: VAT^[3]
HCL Hi: 30slm^[3]
OEM: ASM^[1]
Model: E 2000^[1]
Equipment name: ASM E 2000 Epitaxial Reactor^[1]
Category: Deposition^[1]
Dep/Vent transition valves: Yes^[1]
ATM/RP vent: Yes^[1]
P loop MFCs Dil/SRC/INJ: 20slm/175/175^[1]
N loop MFCs Dil/SRC/INJ: 20slm/175/175^[1]
Aux1: SiH2Cl2 500sccm^[1]
Aux2: SiH4 105sccm^[1]
Aux3: None^[1]
Aux4: GeH4 2000sccm^[1]
Aux5: GeH4 175sccm^[1]
HCl Hi: Yes 20slm^[1]
HCl Low: Yes 1000sccm^[1]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
ASM E 2000 Epitaxial Reactor, 8 inch	—	2001	Source states 8 inch wafer size and a 2001 vintage.	Equipment inventory listing^[3]
ASM E 2000 Epitaxial Reactor, 6 inch	—	—	Source states 6 inch wafer size.	Equipment inventory listing^[4]
ASM E 2000 (6 inch version)	—	—	Configured for 6 inch (150 mm) wafers, Right Hand system, WHC Robot Arm Dual Feed, different gas configuration (e.g., Aux4 GeH4 3500 sccm, Aux5 GeH4 500 sccm, HCl Low 1000 sccm)	Equipment inventory listing^[4]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Supply Voltage/ Freq480/ 50^[2]
Vacuum Load LocksNo^[2]
Pressure ControllerMKS 152 Analogue^[2]
Gas Panel OrientationTop Feed^[2]
Supply Voltage / Freq480 / 50^[3]
ConfigurationVacuum Load Locks^[3]
Supply Voltage / Frequency480 V / 50 Hz^[2]
Vacuum Load LocksNo (some units have Vacuum Load Locks)^[2]
Shaft MFC5 slm^[2]
Aux1 Gas (SiH2Cl2)500 sccm^[2]
Aux2 Gas (SiH4)105 sccm^[2]
HCl Low2000 sccm (some 1000 sccm, 500 sccm)^[2]
Gas DetectionGastec H2/HCl^[2]
Supply voltage / frequency480 / 50^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What CPU and software version does the ASM E 2000 use?

The ASM E 2000 is equipped with a 68040 CPU and runs software version 7.65.^[2]^[1]^[3]^[4]^[5]

What is the supply voltage and frequency for the ASM E 2000?

The supply voltage is 480 V at 50 Hz.^[2]^[1]^[3]^[4]^[5]

Does the ASM E 2000 support silane (SiH4) and dichlorosilane (SiH2Cl2) gases?

Yes, the ASM E 2000 includes auxiliary gas lines for SiH2Cl2 (500 sccm) and SiH4 (105 sccm).^[2]^[1]^[3]^[4]^[5]

Not publicly documented

The following facts about the E 2000 Epitaxial Reactor are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the E 2000 Epitaxial Reactor are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the E 2000 Epitaxial Reactor are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the E 2000 Epitaxial Reactor are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the E 2000 Epitaxial Reactor is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the E 2000 Epitaxial Reactor are on record.
Answerable by: an OEM parts catalog or a service engineer