Waferpedia

Comparison ledger

200 PCU Photoresist StabilizerversusRC 8 Spin

Axcelis 200 PCU Photoresist Stabilizer, SUSS MicroTec RC 8 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

LinkedIn X Email
Side-by-side comparison of selected equipment models
Attribute
200 PCU Photoresist StabilizerAxcelis
RC 8 SpinSUSS MicroTec
OEMAxcelisSUSS MicroTec
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200SUSS MicroTec RC 8 Spin
Specifications
Configuration14 Amps[1]—
Voltage380 V[1]—
Frequency50 Hz[1]—
Phase3 Phase[1]—
200 PCU Photoresist Stabilizer entryRC 8 Spin entryAsk about these tools →Share experience with this comparison →

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing