Comparison ledger
Brewer Science B2, OAI 808, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | B2Brewer Science | 808OAI |
|---|---|---|
| OEM | Brewer Science | OAI |
| Category | Lithography | Lithography |
| Wafer size | 100mm | 100mm |
| Process node | DUV | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brewer Science B2 | OAI 808 |
| Specifications | ||
| Type | Developable BARC[1] | semi-automated, four-camera, optical front- and backside mask aligner[2] |
| Name in ACT-8 process list | B2 DUV42P[1] | — |
| Configured wafer size on ACT-8 | 100 mm (4") wafers[1] | — |
| Motorized features | — | motorized backside focus, motorized auto leveling, auto gap setting[2] |
| Size | — | 2", 100mm, 150mm, 200mm pieces[2] |
| Mask size | — | 4"x4"; 5"x5", 7"x7", and 9"x9"[2] |
| Top side alignment accuracy | — | ± 1.0µm 3σ[2] |
| Bottom side alignment accuracy | — | ± 1.25µm 3σ[2] |
| Large gap alignment accuracy | — | Option / ± 1.5µm 3σ[2] |
| Resolution | — | Vacuum + Hard Contact ≤ 1 µm; Hard Contact ≤ 1.5 µm; Soft Contact ≤ 2.0 µm; Proximity ≥ 3.0 µm[2] |
| Exposure wavelength | — | 350 · ´50 nm[2] |
| Mercury arc lamp | — | 350 W[2] |
| Model | — | OAI 808 Aligner[2] |
| Description | — | Semi-automated, four-camera, optical front- and backside mask aligner[3] |
| Alignment accuracy | — | Top side alignment: ± 1.0µm 3σ; bottom side alignment: ± 1.25µm 3σ; large gap alignment: option / ± 1.5µm 3σ[2] |
| Lamp | — | Mercury arc lamp, 350 W[2] |
| Supported substrate sizes | — | 5 mm to 200 mm[2] |
| Thickness | — | 0.1–10 mm[2] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →