Waferpedia

Comparison ledger

F20versus05 LHP 151

Filmetrics F20, Melles Griot 05 LHP 151, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
F20Filmetrics
05 LHP 151Melles Griot
OEMFilmetricsMelles Griot
CategoryPrecision OpticsPrecision Optics
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyFilmetrics F20Melles Griot 05
Cited variants—
Specifications
Measurement techniquereflectance / optical reflectometry[2]—
Primary measurementfilm thickness[2]—
Materials measureddielectrics, semiconductors, and thin metals[2]—
Spot sizelarge spot[2]—
Optical modelmultilayer optical models[2]—
General use descriptiongeneral purpose film-measurement instrument[1]—
Wavelength range (F20-EXR variant mentioned in source)400-1700 nm[1]—
TechniqueOptical reflectometry (spectral reflectance)[3]—
MeasurementFilm thickness and refractive index (n & k)[2]—
Beam size (ASU configuration)Large spot[2]—
Beam size (Utah configuration)Small spot[4]—
AnalysisMultilayer optical models[2]—
Wavelength range (F20-EXR variant)400–1700 nm[1]—
Configuration—With 05 LPL 340 Power Supply (Does not power on)[5]
Equipment type—Laser[5]
Make—Melles Griot[5]
Model—05 LHP 151[5]
Power state—Does not power on[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]cores.research.asu.educores.research.asu.edu
  3. [3]cores.research.asu.educores.research.asu.edu
  4. [4]nanofab.utah.edunanofab.utah.edu
  5. [5]inventory listing
  6. [6]waferpedia.comwaferpedia.com