Comparison ledger
SUSS MicroTec 150 e Mask, Tokyo Electron Lithius Pro, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | Lithius ProTokyo Electron |
|---|---|---|
| OEM | SUSS MicroTec | Tokyo Electron |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2025 Announcement of LITHIUS Pro DICE |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | Tokyo Electron Lithius |
| Cited variants | — | |
| Specifications | ||
| Configuration | — | Immersion COT and DEV[3] |
| Equipment type | — | Coater / Developer[3] |
| Process description | — | Immersion COT and DEV[3] |
| Pre-/post-exposure process | — | With rinse process at pre-/post exposure[3] |
| FOUP exchanger | — | 1 FOUP exchanger[3] |
| Application | — | Lithography process (ArF Immersion, ArF, KrF, i-line)[1] |
| Throughput | — | Maximum 250 wph capable in future; 200 wph capability with future upgradeability to 250 wph[1] |
| Integration | — | Optimized integration with the exposure tool for maximizing litho cell throughput[1] |
| Chemical consumption | — | Drastically reduced chemical consumption[1] |
| Wafer Size | — | 300mm[2] |
| Throughput (LITHIUS Pro V) | — | 200 wph (upgradeable to 250 wph)[1] |
| Applications | — | ArF Immersion, ArF, KrF, i-line lithography[1] |
| Date of Manufacture (example unit) | — | 2010-04-15[4] |
| Software Version (example unit) | — | 300.0.88.3[4] |
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