Waferpedia

Tokyo Electron

Lithius Pro

LithographyTokyo Electron Lithius family
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The Tokyo Electron LITHIUS Pro is a 300mm wafer coater-developer for semiconductor lithography. The LITHIUS Pro supports ArF immersion, ArF, KrF, and i-line lithography processes. The LITHIUS Pro V variant achieves a maximum throughput of 250 wph.[1][2][3]

Lithius Pro — Inventory photo
Fig. 01Lithius ProInventory photo[4]

Performance

200 wph (upgradeable to 250 wph)[1]

Gas delivery

Coater / Developer[4]

Optics

With Rinse process at pre-/post exposure[4]

What it is

The Tokyo Electron (TEL) CLEAN TRACK LITHIUS Pro is a resist coater and developer used in semiconductor lithography processing. The LITHIUS Pro handles 300 mm wafers. The system is designed for immersion lithography processes. The LITHIUS Pro includes a rinse process applied before and after exposure.[4][3]

Where it fits in the process flow

General reference — not yet source-verified

The LITHIUS Pro is a piece of equipment used in the lithography process, one of the core front-end wafer fabrication steps. The coater-developer is placed upstream and downstream of the exposure tool: it coats wafers with photoresist before exposure and develops the latent image after exposure. The system typically operates inline with a stepper or scanner, forming a lithography cell.

What do the numbers mean?

Wafer handling1

Wafer Size
300mm[2]
Accurate?

Gas & chemistry2

Equipment type
Coater / Developer[4]
Accurate?
Chemical consumption
Drastically reduced chemical consumption[1]
Accurate?

Optics & imaging3

With Rinse process at pre-/post exposure[4]
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Pre-/post-exposure process
With rinse process at pre-/post exposure[4]
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Integration
Optimized integration with the exposure tool for maximizing litho cell throughput[1]
Accurate?

Performance2

Throughput
Maximum 250 wph capable in future; 200 wph capability with future upgradeability to 250 wph[1]
Accurate?
Throughput (LITHIUS Pro V)
200 wph (upgradeable to 250 wph)[1]
Accurate?

Control & software1

Software Version (example unit)
300.0.88.3[3]
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Configuration & options22

Immersion COT and DEV[4]
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1 Foup exchanger[4]
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3BCT[4]
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3COT[4]
Accurate?
3ITC[4]
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6DEV[4]
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3ADH[4]
Accurate?
12CGHA,[4]
Accurate?
6CPHP[4]
Accurate?
6CEHP,[4]
Accurate?
6CGHP[4]
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3BST[4]
Accurate?
3PIR[4]
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2WIS[4]
Accurate?
4SCPL[4]
Accurate?
6CPL[4]
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2WEE[4]
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Process description
Immersion COT and DEV[4]
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FOUP exchanger
1 FOUP exchanger[4]
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Application
Lithography process (ArF Immersion, ArF, KrF, i-line)[1]
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Applications
ArF Immersion, ArF, KrF, i-line lithography[1]
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Date of Manufacture (example unit)
2010-04-15[3]
Accurate?

Vintage & configurations

  1. 2025-12Announcement of LITHIUS Pro DICE[2]

    TEL announced the new CLEAN TRACK LITHIUS Pro DICE in December 2025.

Documented models & variants

DesignationGenerationVintageChangesSource
CLEAN TRACK LITHIUS Pro V——No differences from the base line stated in the source beyond the variant designation.web.archive.org[1]
CLEAN TRACK LITHIUS Pro V-i——No differences from the base line stated in the source beyond the variant designation.web.archive.org[1]
LITHIUS Pro V——High-productivity platform with 200 wph throughput upgradeable to 250 wph; optimized integration with exposure tool.web.archive.org[1]
LITHIUS Pro V-i——Variation of LITHIUS Pro V; details not specified in sources.web.archive.org[1]
LITHIUS Pro-i——Listed alongside LITHIUS Pro; likely a variant with i-line optimization.web.archive.org[1]
LITHIUS Pro DICE—2025Announced December 2025; features defect control technology reducing resist coating defects by 50% or more; world-class productivity; improved environmental performance.tel.com[2]
LITHIUS Pro Z——Previous model provided for over a decade; preceded LITHIUS Pro DICE.tel.com[2]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Equipment typeCoater / Developer[4]
  • Chemical consumptionDrastically reduced chemical consumption[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What wafer size does the LITHIUS Pro handle?

The LITHIUS Pro is configured for 300 mm wafers.[3]

Not publicly documented

The following facts about the Lithius Pro are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • The control-system platform and OS era of the Lithius Pro are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Lithius Pro are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Lithius Pro is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Lithius Pro are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the Lithius Pro are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

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Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]web.archive.org — tel.com (Oct 18, 2009)web.archive.org
  2. [2]tel.com — tel.comtel.com
  3. [3]macquarie.com — macquarie.commacquarie.com
  4. [4]Inventory photo
  5. [5]web.archive.orgweb.archive.org
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Last updated Oct 5, 2026.

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