Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Oxford Instruments PC2000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | PC2000Oxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Oxford Instruments PC2000 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| System type | — | plasma system[5] |
| User login system | — | Password controlled user login with different levels of access[5] |
| Data logging | — | Continuous system data logging for traceability of each wafer and process run[5] |
| Communication standard | — | Fully GEM/SECS compatible[5] |
| Cluster control | — | Ability to control a tool cluster from a single interface and PC[5] |
| Operating system | — | Windows XP[6] |
| PLC type | — | Black PLC (older, not upgradeable)[6] |
| Software type | — | Process tool software[5] |
| Interface | — | Front-end visual[5] |
| Recipe management | — | Yes[5] |
| User access control | — | Password-controlled[5] |
| Communication protocol | — | GEM/SECS compatible[5] |
| Host operating system | — | Windows XP[6] |
| Customization | — | Per machine[6] |