Waferpedia

Comparison ledger

0020 17485 PartversusMVD100E

Applied Materials 0020 17485 Part, SPTS MVD100E, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
OEMApplied MaterialsSPTS
CategoryDepositionDeposition
Wafer size—200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartSPTS MVD100E
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]—
processing mode—Single substrate or small batch processing[2]
wafer size—200mm wafers[2]
substrate handling—Components on trays or racks[2]
chamber volume—Small chamber volume for fast processing[2]
access design—Top-opening for ease of maintenance and cleaning[2]
process capability—Integrated plasma surface treatment and chamber clean capability[2]
automation—Automated process sequence routines[2]
diagnostics—Exceptional reliability with extensive self-diagnostic and data logging capability[2]
capability—MVD and ALD-capable[2]
Wafer size—200mm[2]
Diagnostics—Extensive self-diagnostic and data logging capability[2]
Deposition capability—MVD and ALD-capable[2]
Reliability—Exceptional reliability[2]
Product type—Deposition Tool[3]
Process type—Molecular Vapor Deposition (MVD) system[2]
Intended use—R&D or pilot manufacturing[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]atomiclayerdeposition.comatomiclayerdeposition.com