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SPTS

MVD100E

Deposition200mmSPTS MVD100E family
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The SPTS MVD100E is a Molecular Vapor Deposition system. The SPTS MVD100E is designated for research and development or pilot manufacturing. The SPTS MVD100E handles 200mm wafers.[1][2]

MVD100E — web.archive.org
Fig. 01MVD100Eweb.archive.org[1]

What it is

The SPTS MVD100E is a Molecular Vapor Deposition (MVD) system.[1]

The MVD100E is the designated tool for research and development or pilot manufacturing.[1][2][3]

The system is capable of both MVD and atomic layer deposition (ALD) processes.[1][3]

How it works

The MVD100E has a small chamber volume designed for fast processing.[1][3]

The chamber opens from the top to ease maintenance and cleaning.[1][3]

The system includes integrated plasma surface treatment and a chamber clean capability.[1][3]

Automated process sequence routines and extensive self-diagnostic and data logging capabilities are provided.[1][3]

Where it fits in the process flow

The MVD100E processes a single substrate or small batches of wafers.[1][3]

The system handles substrates on trays or racks and is designed for two-hundred-millimeter wafers.[1][3]

Applications

The MVD100E is used for MEMS devices, including sensors, actuators, displays, RF switches, inkjets, and data storage devices.[1][3]

BioMEMS applications include wetting control in micro-fluidics, such as lab-on-a-chip and microplates, as well as passivation on implantable devices and functionalized surface coatings for genome sequencing and diagnostics.[1][3]

The system finds use in production applications requiring moisture barriers, anticorrosion coatings, or release layers for imprinting.[1][3]

  • MEMS devices
  • sensors
  • actuators
  • displays
  • RF switches
  • inkjets
  • data storage devices
  • BioMEMS
  • wetting control in micro-fluidics
  • lab-on-a-chip
  • microplates
  • passivation on implantable devices requiring biocompatible surface coatings
  • devices requiring functionalized surface coatings
  • genome sequencing
  • diagnostics
  • production applications requiring moisture barriers
  • anticorrosion coatings
  • release layers for imprinting

What do the numbers mean?

Wafer handling4

processing mode
Single substrate or small batch processing[1]
Accurate?
wafer size
200mm wafers[1]
Accurate?
substrate handling
Components on trays or racks[1]
Accurate?
Wafer size
200mm[1]
Accurate?

Configuration & options12

chamber volume
Small chamber volume for fast processing[1]
Accurate?
access design
Top-opening for ease of maintenance and cleaning[1]
Accurate?
process capability
Integrated plasma surface treatment and chamber clean capability[1]
Accurate?
automation
Automated process sequence routines[1]
Accurate?
diagnostics
Exceptional reliability with extensive self-diagnostic and data logging capability[1]
Accurate?
capability
MVD and ALD-capable[1]
Accurate?
Diagnostics
Extensive self-diagnostic and data logging capability[1]
Accurate?
Deposition capability
MVD and ALD-capable[1]
Accurate?
Reliability
Exceptional reliability[1]
Accurate?
Product type
Deposition Tool[2]
Accurate?
Process type
Molecular Vapor Deposition (MVD) system[1]
Accurate?
Intended use
R&D or pilot manufacturing[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What substrate handling does the MVD100E support?

The MVD100E supports single substrate or small batch processing. The MVD100E handles components on trays or racks. The MVD100E is designed for two-hundred-millimeter wafers.[1][2]

What process capabilities are built into the MVD100E?

The MVD100E includes integrated plasma surface treatment and chamber clean capability. The MVD100E also provides automated process sequence routines, extensive self-diagnostic capability, and data logging capability.[1][2]

Not publicly documented

The following facts about the MVD100E are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MVD100E are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the MVD100E are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the MVD100E are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the MVD100E are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the MVD100E is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]atomiclayerdeposition.com — atomiclayerdeposition.comatomiclayerdeposition.com
  3. [3]MVD100E — SPTS | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 6, 2026.

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