Waferpedia

Comparison ledger

WS 620 Cversus1000P

SCREEN WS 620 C, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
WS 620 CSCREEN
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilySCREEN WS 620 CYES 1000P
Specifications
ConfigurationConvertible to 8"[1]Parallel plate[4]
ManufacturerSCREEN / DNS[1]—
ModelWS 620 C[1]1000P[3]
Tool typeWet Bench[1]—
CategoryWet Processing / Clean[2]—
Wafer sizes6 inch[1]—
Convertible to8 inch[1]—
Tank configurationCaro (SPM), H/C QDR, dHF, EDR, hotPhos, H/C QDR, SC1, QDR, SC2, H/C QDR, FR, IPA Vapor Dryer[1]—
System type—Plasma cleaning system[3]
Shelf configuration—Four 16 x 16 inch shelves[3]
Total capacity—1024 square inches[3]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[3]
Number of shelves—4[3]
Shelf size—16 x 16 inches[3]
Power—1000 W[4]
Operation modes—Active, RIE, Downstream[3]
Sample size range—From smallest semiconductor chip to large flat panels[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]web.archive.orgweb.archive.org
  4. [4]semistarcorp.comsemistarcorp.com