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The Kurt Lesker ALD-150LX is a plasma-enhanced atomic layer deposition system used for thin-film growth with atomic-scale control.
The Kurt Lesker ALD-150LX is a plasma-enhanced atomic layer deposition system with a load-locked process chamber and in situ ellipsometer, configured for up to 150 mm wafers.
The Kurt J Lesker Nano36 Thermal Deposition System is a cleanroom thin film fabrication tool for thermal deposition of metals. The Kurt J Lesker Nano36 Thermal Deposition System supports substrates up to 150 mm in diameter and uses controller-based thickness monitoring.