ASML
The ASML 5500/80 is an i-line wafer stepper. The ASML 5500/80 is set up for 4-inch wafers. The ASML 5500/80 is convertible to 3-inch or 6-inch platforms.[1][2]

Wafer size
4-inch wafers; convertible to 3-inch or 6-inch platforms
Node / era
500nm resolution
Performance
<70nm[1]
Optics
500nm[1]
The ASML 5500/80 is an i-line wafer stepper used for photolithography on wafers.
A wafer stepper projects a patterned image from a mask onto photoresist-coated wafers through a reduction optical system. The tool exposes one field at a time and then advances the wafer to the next field for repeated pattern transfer.
The ASML 5500/80 sits in the photolithography portion of wafer fabrication. The tool is used after resist coating and alignment and before the developed pattern is transferred into underlying films by later process steps.
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The following facts about the 5500/80 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5500/80 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 5500/80 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 5500/80 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 5500/80 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No publicly documented compatible parts, consumables, or accessories for the 5500/80 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 5, 2026.
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