ASML
TWINSCAN EXE:5000
The TWINSCAN EXE:5000 is a dual-stage extreme ultraviolet (EUV) lithography system. The TWINSCAN EXE:5000 is the first machine in the High NA generation, using a 13.5 nm light source and a numerical aperture of 0.55. The TWINSCAN EXE:5000 achieves a resolution of 8 nm.[1]
Introduced
2023
Optics
13.5 nm[1]
What it is
EUV lithography systems are used to print the most intricate layers of advanced microchips. The EXE:5000 is designed to support production of advanced Logic and Memory chips.[1]
How it works
The machine operates in a high vacuum environment because EUV light is absorbed by air. A dual-stage wafer handler transfers wafers in and out of the vacuum through an air lock. The system uses a high-accuracy wafer stage that positions the wafer to within a quarter of a nanometer, checking and adjusting its position many times per second.[1]
Where it fits in the process flow
The EXE:5000 is intended for high-volume manufacturing of the most critical layers of advanced semiconductor devices. In a typical fab flow, EUV systems print the complex base layers of logic and memory chips, while less critical layers are patterned using deep ultraviolet (DUV) lithography systems.[1]
What can it run?
Process applications and technology nodes documented for this tool.
- Advanced Logic chip production
- Advanced Memory chip production
What do the numbers mean?
Optics & imaging3
Configuration & options4
Vintage & configurations
- 2023-12First delivery[1]
The first High NA EUV lithography system (TWINSCAN EXE:5000) was delivered in December 2023.
- 2023First in new generation[1]
The first High NA EUV lithography system was delivered in December 2023.
- 2025Planned high-volume support[1]
The EXE platform will support high-volume chip manufacturing in 2025–2026.
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| TWINSCAN EXE:5200B | High NA | — | Designed to support volume production of sub-2 nm Logic nodes and leading-edge DRAM nodes. | asml.com[1] |
What replaced it?
Related models
- siblingASML TWINSCAN NXE:3800E— NXE systems use 0.33 NA EUV for 13 nm resolution; EXE is next-generation High NA.source[1]
- siblingASML TWINSCAN EXE:5200B— Later variant for sub-2 nm Logic and leading-edge DRAM.source[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of lithography system is the TWINSCAN EXE:5000?
The TWINSCAN EXE:5000 is a dual-stage extreme ultraviolet (EUV) lithography system.[1]
What generation of lithography does the EXE:5000 belong to?
The EXE:5000 is the first system in the High NA generation of EUV lithography, designated as the EXE platform.[1]
Which types of chip production does the EXE:5000 support?
The EXE:5000 supports advanced Logic and Memory chip production, including future nodes such as 2 nm Logic and similar-density Memory nodes.[1]
Not publicly documented
The following facts about the TWINSCAN EXE:5000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the TWINSCAN EXE:5000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TWINSCAN EXE:5000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TWINSCAN EXE:5000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the TWINSCAN EXE:5000 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the TWINSCAN EXE:5000 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]asml.com — asml.comasml.com
Last updated Sep 30, 2026.
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