Laurell
EDC-HL-15
The Laurell EDC-HL-15 is a 650-series EDC spin processor. The Laurell EDC-HL-15 accommodates up to 300mm wafers. The Laurell EDC-HL-15 has a 12,000 RPM capability with vacuum hold-down.[1][2]
What it is
How it works
The EDC-HL-15 uses an internal bowl-shaped chamber with a bottom gutter and a clear dome lid. The system features an adjustable down-flow exhaust and drain that is monitored by the process controller. The 650-series process controller allows real-time interaction, pausing, and continuation. A proprietary labyrinth seal, pressurized with nitrogen, protects the motor and electronics. The chamber is electrically interlocked to prevent rotation when the lid is open.[1][2]
Where it fits in the process flow
General reference — not yet source-verifiedSpin coaters are used in photolithography sequences, typically after substrate cleaning and before exposure and development. The machine applies a uniform photoresist layer that is then soft-baked, exposed, and developed.
Applications
General reference — not yet source-verifiedThe EDC-HL-15 is suited for research and development, as well as small-volume production of semiconductor devices, MEMS, and other microelectronic components.
- Etch
- Develop
- Clean
- solvent or aqueous rinse
What do the numbers mean?
Power & electrical1
Vacuum & pumping2
Wafer handling3
Configuration & options4
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| EDC-HL-15 B | 650-series | — | Base designation stated on the source page. | web.archive.org[1] |
| EDC-HL-23B | 650-series | — | Listed by the source as another model under the same model selection area. | web.archive.org[1] |
| EDC-HL-8B | 650-series | — | Listed by the source as another model under the same model selection area. | web.archive.org[1] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the EDC-HL-15 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-HL-15 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the EDC-HL-15 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EDC-HL-15 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EDC-HL-15 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the EDC-HL-15 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]EDC-HL-15 Spin Coater - Laurell Technologies — images.laurell.comimages.laurell.com
- [3]EDC-HL-15 — Laurell | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
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