Laurell

EDC-HL-23

Spin coater 150mm650-seriesLaurell EDC-HL-23 family

Research Quality: 40% complete

LinkedIn X Email

EDC-HL-23 — web.archive.org — Fig. 01EDC-HL-23web.archive.org^[1]

Wafer size

150mm

Power

95 to 240 VAC, 47/63 Hz, ~300 Watts^[1]

Vacuum

12,000 RPM with vacuum hold-down^[1]

What is it?

The EDC-HL-23 B is a Laurell EDC spin processor described as compact and equipped with a 650-series process controller. The source states it accommodates up to 150 mm wafers and 5 in x 5 in (127 mm x 127 mm) substrates, with a 12,000 RPM capability using vacuum hold-down but a recommendation for 3,000 RPM and non-vacuum chucks.

What can it run?

Process applications and technology nodes documented for this tool.

Etch
Develop
Clean
Rinse

What do the numbers mean?

Power & electrical1

Power: 95 to 240 VAC, 47/63 Hz, ~300 Watts^[1]

Vacuum & pumping4

Maximum rotation capability: 12,000 RPM with vacuum hold-down^[1]
Recommended operating speed: 3,000 RPM with non-vacuum chucks^[1]
Nitrogen/CDA seal purge pressure: 60–70 PSIG (4–5 bar)^[1]
Vacuum recommendation: 25–28 inches Hg with 4.5 SCFM at 0 inches Hg^[1]

Wafer handling2

Wafer capacity: Up to 150 mm wafers^[1]
Substrate capacity: Up to 5 in x 5 in (127 mm x 127 mm) substrates^[1]

Control & software1

Process controller: 650-series process controller^[1]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
EDC-HL-23 B	650-series	—	—	web.archive.org^[1]

Interested in this tool?

Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Maximum rotation capability12,000 RPM with vacuum hold-down^[1]
Recommended operating speed3,000 RPM with non-vacuum chucks^[1]
Power95 to 240 VAC, 47/63 Hz, ~300 Watts^[1]
Nitrogen/CDA seal purge pressure60–70 PSIG (4–5 bar)^[1]
Vacuum recommendation25–28 inches Hg with 4.5 SCFM at 0 inches Hg^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Not publicly documented

The following facts about the EDC-HL-23 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-HL-23 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the EDC-HL-23 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EDC-HL-23 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EDC-HL-23 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the EDC-HL-23 are on record.
Answerable by: an OEM parts catalog or a service engineer