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MKS

CH24P1

MKS CH24P1 family
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The MKS CH24P1 is a remote plasma source for high flow applications. The MKS CH24P1 has 24 kW RF power output. The MKS CH24P1 supports EtherCAT or analog DB25 communication.[1][2]

MKSCH24P1
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Power

24 kW[3]

Performance

±1%[3]

Gas delivery

Ar NF3[1]

What it is

The MKS CH24P1 is a remote plasma source for high flow applications.[2][1]

The CH24P1 is used as an auxiliary plasma unit in semiconductor process tools, where remote plasma generation supports chamber cleaning and related gas-treatment functions.[2][1]

How it works

The CH24P1 uses a split-powered DC and RF architecture with a rack-mounted DC power supply and a remote toroidal applicator head.[2][4][5]

The CH24P1 generates remote plasma for NF3 destruction and for mixed gas species applications, and the product supports NF3, O2, N2, and Ar.[2][4][5]

The CH24P1 uses EtherCAT communication for key parameter streaming and supports analog control through a DB25 interface.[2][1][6]

Where it fits in the process flow

The CH24P1 fits into larger atomic layer deposition chambers and quad-style chemical vapor deposition chambers used in semiconductor, flat panel display, and photovoltaic processes.[2][4][5]

The CH24P1 is positioned for chamber clean applications and for high flow mixed gas species applications, which places it in plasma-assisted chamber maintenance and process-support roles rather than in wafer patterning or deposition itself.[2][4][5]

Applications

The CH24P1 is intended for semiconductor, flat panel display, and photovoltaic processes.[2][4][5]

The CH24P1 is specified for NF3 chamber clean use and for mixed gas species work with NF3, O2, N2, and Ar.[2][4][5]

What do the numbers mean?

Power & electrical6

Output Power
24 kW[3]
Accurate?
Power Output
24 kW[1]
Accurate?
RF Frequency
400 kHz[1]
Accurate?
Power Requirements
208 V, 3 phase 50/60 Hz, 75 Amps RMS max phase[1]
Accurate?
Dimensions
Remote Head: 22.02 x 10.76 x 11.1 in. (55.93 x 27.33 x 28.19 cm); Power Supply: 21.24 x 19.00 x 7.0 in. (53.95 x 48.26 x 17.78 cm)[1]
Accurate?
Weight
Remote Head: 100 lbs. (45.36 kg); Power Supply: 62 lbs. (28.12 kg)[1]
Accurate?

Gas & chemistry3

Gas Supply During Ignition
Ar NF3[1]
Accurate?
Inlet Gas Connection
KF40[1]
Accurate?
Outlet Gas Connection
KF50[1]
Accurate?

Performance2

Power Set Point Accuracy
±1%[3]
Accurate?
Accuracy
±1% to power set point[1]
Accurate?

Control & software2

Communication Interface
EtherCAT or Analog DB25[3]
Accurate?
Control Interface
Analog: DB25; Digital: EtherCAT[1]
Accurate?

Configuration & options8

Design
Compact split applicator power design[3]
Accurate?
Application
High flow applications[3]
Accurate?
Type
Remote Plasma Source for High Flow Applications[1]
Accurate?
Operating Window
1-25 slm 20T[2]
Accurate?
Mixed Species Space
30-90 slm[2]
Accurate?
Compatible Species
NF3, O2, N2, Ar[1]
Accurate?
THD
<15%[1]
Accurate?
Compliance
SEMI F47[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
RPS-CH24P1-P24C——Remote Plasma Source, 24 kW, High Flow Applications.mks.com[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Output Power24 kW[3]
  • Power Output24 kW[1]
  • RF Frequency400 kHz[1]
  • Gas Supply During IgnitionAr NF3[1]
  • Inlet Gas ConnectionKF40[1]
  • Outlet Gas ConnectionKF50[1]
  • Power Requirements208 V, 3 phase 50/60 Hz, 75 Amps RMS max phase[1]
  • DimensionsRemote Head: 22.02 x 10.76 x 11.1 in. (55.93 x 27.33 x 28.19 cm); Power Supply: 21.24 x 19.00 x 7.0 in. (53.95 x 48.26 x 17.78 cm)[1]
  • WeightRemote Head: 100 lbs. (45.36 kg); Power Supply: 62 lbs. (28.12 kg)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What plasma power does the CH24P1 provide?

The CH24P1 provides 24 kW RF power output.[2][4][5][6]

What gases and species does the CH24P1 support?

The CH24P1 supports NF3, O2, N2, and Ar.[2][4][5][6]

What process tools is the CH24P1 intended for?

The CH24P1 is intended for larger ALD and quad-style CVD chambers.[2][4][5]

What control interfaces are specified for the CH24P1?

The CH24P1 specifies analog control through DB25 and digital communication through EtherCAT.[2][6]

What utility requirements are specified for the CH24P1?

The CH24P1 specifies 208 V three-phase power at 50/60 Hz and maximum 75 Amps RMS per phase, with remote head water flow of 3 gpm and DC power supply water flow of 2 gpm.[2][6]

Not publicly documented

The following facts about the CH24P1 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CH24P1 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the CH24P1 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the CH24P1 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the CH24P1 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the CH24P1 are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (6)Every fact above is drawn from these public sources
  1. [1]mks.com — mks.commks.com
  2. [2]api.p1.mks.com — api.p1.mks.comapi.p1.mks.com
  3. [3]api.p1.mks.com — api.p1.mks.comapi.p1.mks.com
  4. [4]RPS-CH24P1 Remote Plasma Source for High Flow Appl — en.sekorm.comen.sekorm.com
  5. [5]RPS-CH24P1 Remote Plasma Source for High Flow Appl — sekorm.comsekorm.com
  6. [6]MKS RPS-CH24P1-P24C Remote Plasma Source for High Flow Applications (24 kW) | EMIN.ASIA — emin.asiaemin.asia
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Last updated Oct 9, 2026.

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