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SUSS MicroTec

AS 8 Alta Spray

SUSS MicroTec AS 8 family
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The SUSS MicroTec AS 8 Alta Spray is a manual spray coater for high topographies. The SUSS MicroTec AS 8 Alta Spray supports wafer sizes of 3, 4, 5, 6, and 8 inch. The SUSS MicroTec AS 8 Alta Spray supports substrates up to 200 mm and square substrates up to 6 inch edge length.[1][2]

AS 8 Alta Spray — Inventory photo
Fig. 01AS 8 Alta SprayInventory photo[2]

Vacuum

Pressure tank system 10 L SS with coupling[2]

Gas delivery

Filter unit solvent[2]

What it is

The SUSS MicroTec AS 8 Alta Spray is a spray coater for semiconductor and microfabrication substrates.[2][1][5][4]

How it works

The AS 8 Alta Spray uses resist spray dispense hardware, a pre-wet dispense nozzle, solvent cleaning, and a pressure tank system to support coating and cleaning steps.[2][3]

Applications

The AS 8 Alta Spray is used for research and low-volume production work.[1]

The AS 8 Alta Spray is used for coating substrates up to 200 mm and square substrates up to 6 inch edge length.[1]

The AS 8 AltaSpray is used for MEMS, three-dimensional integration, wafer-level packaging, and related applications that require conformal resist films over corners, cavities, through-silicon vias, and lenses.[5][4]

The AS 8 AltaSpray is used with resist materials including SU-8, S1800, and AZ formulations.[4]

What do the numbers mean?

Vacuum & pumping2

Pressure tank system 10 L SS with coupling[2]
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Pressure tank system
10 L SS with coupling[2]
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Wafer handling7

Substrate assembly R6 Altaspray BSR ready[2]
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Substrate size
Up to 200 mm and square substrates up to 6 inch edge length[1]2 sources
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Wafer sizes
3, 4, 5, 6, 8 inch[2]
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Spray coater description
Spray coater for 3-inch to 8-inch wafers[3]
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Maximum substrate size
8 inch[4]
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Substrate assembly
R6 Altaspray BSR ready[2]
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Chuck rotation
Up to 1,000 rpm[1]
Accurate?

Gas & chemistry9

High precision resist spray dispense system up to 30 CPS, Resist type[2]
Accurate?
Pre wet dispense nozzle Altaspray, bowl clean solvent type[2]
Accurate?
Filter unit solvent[2]
Accurate?
Resist storage stainless steel (x2)[2]
Accurate?
Resist spray dispense system
High precision resist spray dispense system up to 30 CPS, Resist type[2]
Accurate?
Pre-wet dispense nozzle
Altaspray, bowl clean solvent type[2]
Accurate?
Resist storage
Stainless steel (x2)[2]
Accurate?
Nozzles
Dual spray nozzles and separate solvent nozzle[1]
Accurate?
Filter unit
Solvent[2]
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Configuration & options16

With:[2]
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Media storage SS EX[2]
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Waste canister (10 L stainless steel[2]
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Transformer for manual tool[2]
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Manual[2]
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Tool type
Manual spray coater for high topographies[1]
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Media storage
SS EX[2]
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Waste canister
10 L stainless steel[2]
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Transformer
For manual tool[2]
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Vintage
2018[2]
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Spray axis velocity
Up to 500 mm/s[1]
Accurate?
Acceleration
Up to 9 m/s²[1]
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Z-axis adjustment range
Up to 45 mm[1]
Accurate?
Nozzle adjustment range
67.5 mm to 107.5 mm[1]
Accurate?
Maximum rotation speed
Up to 1,000 rpm[1]
Accurate?
Manual
2018[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationHigh precision resist spray dispense system up to 30 CPS, Resist type[2]
  • ConfigurationPre wet dispense nozzle Altaspray, bowl clean solvent type[2]
  • ConfigurationFilter unit solvent[2]
  • ConfigurationResist storage stainless steel (x2)[2]
  • ConfigurationPressure tank system 10 L SS with coupling[2]
  • Resist spray dispense systemHigh precision resist spray dispense system up to 30 CPS, Resist type[2]
  • Pre-wet dispense nozzleAltaspray, bowl clean solvent type[2]
  • Pressure tank system10 L SS with coupling[2]
  • Resist storageStainless steel (x2)[2]
  • NozzlesDual spray nozzles and separate solvent nozzle[1]
  • Filter unitSolvent[2]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What wafer sizes does the SUSS AS 8 Alta Spray support?

The AS 8 Alta Spray supports wafer sizes of 3, 4, 5, 6, and 8 inch, and round substrates up to 200 mm. Square substrates up to 6 inch edge length are also supported.[2][1][4][3]

What is the maximum chuck rotation speed?

The maximum chuck rotation speed is 1000 rpm.[1][3]

What is the spray axis velocity range?

The spray axis velocities can reach up to 500 mm/s, with acceleration up to 9 m/s².[1][3]

What is the z-axis adjustment range of the nozzle?

The z-axis adjustment range is up to 45 mm, and the nozzle adjustment range is from 67.5 mm to 107.5 mm.[1][3]

What photoresist types can be used with the AS 8 Alta Spray?

Common resist types that can be used with the AS 8 Alta Spray include SU-8, S1800, and various AZ formulations. The resist dispense system can handle viscosities up to 30 CPS.[4][2][3]

Does the AS 8 Alta Spray support square substrates?

Yes, the AS 8 Alta Spray supports square substrates up to 6 inch edge length.[1][3]

Not publicly documented

The following facts about the AS 8 Alta Spray are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the AS 8 Alta Spray are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the AS 8 Alta Spray are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the AS 8 Alta Spray are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the AS 8 Alta Spray are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the AS 8 Alta Spray is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]suss.com — suss.comsuss.com
  2. [2]Inventory photo
  3. [3]waferpedia.com — waferpedia.comwaferpedia.com
  4. [4]nnci.net — nnci.netnnci.net
  5. [5]SUSS MicroTec AS8 AltaSpray - The Singh Center for Nanotechnology Wiki — wiki.nano.upenn.eduwiki.nano.upenn.edu
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Last updated Oct 7, 2026.

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