Tokyo Electron
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The Tokyo Electron TE 8500 is an etch system from Tokyo Electron. The TE 8500 P Dry is a dry etching system for 6-inch wafers. The TE 8500 PESC Dry is a dry etcher with one chamber for oxide etch with endpoint capability.[1][2]
Dry etching systems use plasma generated from reactive gases to remove material from a wafer surface. The process takes place in a vacuum chamber.
In semiconductor fabrication, dry etching is used after photolithography to transfer the resist pattern into the underlying layer. The TE 8500 is typically employed in the etch step of the process flow.
The TE 8500 PESC Dry variant is specifically used for oxide etching with endpoint detection.[1]
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The TE 8500 P Dry supports 6-inch wafers, while other TE 8500 models support 8-inch wafers.[1][4][3][2]
The TE 8500 PESC Dry is a single-chamber dry etcher for oxide etching with endpoint detection capability.[1]
The following facts about the TE 8500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TE 8500 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the TE 8500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TE 8500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TE 8500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the TE 8500 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 3, 2026.
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