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Varian

Viision 80 Ion

Ion ImplantationVarian Viision 80 family
Research Quality: 50% complete
Viision 80 Ion — Inventory photo
Fig. 01Viision 80 IonInventory photo[1]

What it is

The Varian Viision 80 is an ion implanter.[1][2][4][3]

How it works

General reference — not yet source-verified

An ion implanter generates a beam of ions from a source, isolates the desired ion species using a mass analyzer, accelerates the ions to the required energy, and then scans the beam across the wafer surface. The depth of ion penetration is controlled by the acceleration energy, while the dose is controlled by the beam current and exposure time.

Where it fits in the process flow

General reference — not yet source-verified

Ion implantation typically follows photoresist patterning and precedes thermal annealing. The resist defines areas to be doped, and the implant step introduces dopants. After implantation, an anneal step activates the dopants and repairs crystal damage.

What do the numbers mean?

Power & electrical16

Phase
3 Phase[1]
Accurate?
208 Volts[1]
Accurate?
50/60 Hz[1]
Accurate?
Voltage
208 V[3]
Accurate?
95 Amps[3]
Accurate?
Electrical phase
3 Phase[1]
Accurate?
Electrical wires
5 Wire[1]
Accurate?
Voltage range
200-230 Vac[2]
Accurate?
Frequency
50/60 Hz[1]
Accurate?
Full load current
95 Amps[3]
Accurate?
Voltage
208 V (3-phase, 5-wire)[1]
Accurate?
Voltage
200-230 Vac (3-phase)[2]
Accurate?
Current
95 Amps[3]
Accurate?
Electrical configuration
3 Phase - 5 Wire - 208 Volts - 50/60 Hz[1]
Accurate?
Electrical configuration
3 Phase - 50/60 Hz - 200-230 Vac[2]
Accurate?
Electrical configuration
208 V - 3 Phase - 5 Wire - 35 kVA - 50/60 Hz - 95 Amps - 50 A Max.[3]
Accurate?

Configuration & options16

5 Wire[1]
Accurate?
200-230 Vac[2]
Accurate?
Power
35 kVA[3]
Accurate?
50 A Max.[3]
Accurate?
High Current[3]
Accurate?
Maximum current
50 A[3]
Accurate?
High current
Yes[3]
Accurate?
Wiring
5 Wire[1]
Accurate?
Max Current
50 A[3]
Accurate?
Type
High Current[3]
Accurate?
OEM
Varian[1]
Accurate?
Model
Viision 80[1]
Accurate?
Equipment type
Ion Implanter[1]
Accurate?
Vintage
1997[1]
Accurate?
Vintage
1996[3]
Accurate?
Current class
High Current[3]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Viision 80 High Current——High current variantEquipment inventory listing[3]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Phase3 Phase[1]
  • Configuration208 Volts[1]
  • Configuration50/60 Hz[1]
  • Voltage208 V[3]
  • Configuration95 Amps[3]
  • Electrical phase3 Phase[1]
  • Electrical wires5 Wire[1]
  • Voltage range200-230 Vac[2]
  • Frequency50/60 Hz[1]
  • Full load current95 Amps[3]
  • Voltage208 V (3-phase, 5-wire)[1]
  • Voltage200-230 Vac (3-phase)[2]
  • Current95 Amps[3]
  • Electrical configuration3 Phase - 5 Wire - 208 Volts - 50/60 Hz[1]
  • Electrical configuration3 Phase - 50/60 Hz - 200-230 Vac[2]
  • Electrical configuration208 V - 3 Phase - 5 Wire - 35 kVA - 50/60 Hz - 95 Amps - 50 A Max.[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What does an ion implantation machine do?General reference — not yet source-verified

It injects selected ions into a substrate to change the material's electrical characteristics in a controlled way.

Why is implantation used instead of other doping methods?General reference — not yet source-verified

It allows precise control of where dopants go and how deeply they penetrate, which is important for device structure formation.

Does ion implantation finish the doping step by itself?General reference — not yet source-verified

It creates the implanted dopant profile, but later thermal processing is commonly used in the broader flow to activate the dopants and repair damage.

What kinds of substrates are processed in this class of tool?General reference — not yet source-verified

Machines of this class are used primarily for semiconductor wafers and other substrates that require controlled doping or near-surface modification.

Not publicly documented

The following facts about the Viision 80 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Viision 80 Ion are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Viision 80 Ion are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Viision 80 Ion are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Viision 80 Ion is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Viision 80 Ion are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]inventory listing
  4. [4]Equipment inventory listing
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Last updated Oct 3, 2026.

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