Zeiss
The Zeiss Supra 55 is a field-emission scanning electron microscope (FE-SEM) that uses a Schottky thermal field emission source to achieve high-resolution imaging. The Supra 55 provides an ultimate imaging resolution in the range of 2 nm and an accelerating voltage range of 0.2 to 30 kV.[1][2]

Plate 01Zeiss Supra 55 Training Video Part 1 Review
The Zeiss Supra 55 is a scanning electron microscope used for metrology and inspection. The Zeiss Supra 55 belongs to the field-emission SEM class and is used for high-resolution surface imaging and characterization.[1][2][4][5]
The Zeiss Supra 55 uses multiple detectors for secondary-electron and backscatter signals. The Zeiss Supra 55 can also support cathodoluminescence detection and electron-beam-lithography-related use when configured for those functions.[2][1]
The Zeiss Supra 55 VP operates in high vacuum and variable-pressure modes. The Zeiss Supra 55 VP includes a load-lock system for specimen exchange without venting the main chamber.[4][5]
The Zeiss Supra 55 is used for high-resolution imaging of surface topography. The Zeiss Supra 55 is used for secondary-electron imaging, backscatter imaging, and composition-sensitive contrast when fitted with the relevant detectors.[2][1]
The Zeiss Supra 55 is used for materials characterization. The Zeiss Supra 55 is also used for nanomanipulation and force measurement in setups that include those accessories.[2]
The Zeiss Supra 55 VP is used for samples with a wide range of conductivity. The Zeiss Supra 55 VP is used for solid-sample compositional analysis when equipped with energy-dispersive spectroscopy.[5][4]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Supra 55 VP | — | — | Variable-pressure version; sources state high-vacuum and VP modes, with a load-lock system on one source and VP capability up to 1.33 mbar on another. | bu.edu[5] |
| Supra 55 FESEM | — | — | Described as a FESEM with a Schottky thermal field emission source. | cmdis.rpi.edu[1] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the Supra 55 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Supra 55 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Supra 55 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Supra 55 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Supra 55 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Supra 55 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Last updated Oct 10, 2026.
The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.