SUSS MicroTec
Wafer size
300mm
Optics
Excimer Laser[1]
The ELP300 Gen2 is used for ablation, laser-assisted debonding, and laser seed layer removal.[1]
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The following facts about the ELP300 Gen2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ELP300 Gen2 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the ELP300 Gen2 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the ELP300 Gen2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ELP300 Gen2 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ELP300 Gen2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 22, 2026.
The ACS300 Gen3 is an automated coating and developing system for wafers up to 300 mm.
The SUSS MicroTec AD12 is a manual system for aqueous developing and wafer cleaning, handling wafers up to 300 mm.
The SUSS MicroTec AS8 / 12 is a manual coating and developing system for wafers up to 300 mm, with spray coating as its primary process.