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Manufacturer

AJA

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16 entries

  1. ATC 2200AJA

    The AJA ATC 2200 is a UHV sputtering system used for physical vapor deposition of films on substrates.

    CategoryDepositionWafer6"
  2. ATC OrionAJA

    The AJA ATC Orion 8 UHV Sputtering System is a physical vapor deposition tool that deposits films on a substrate using magnetron sputtering.

    CategoryDepositionWafer6 in
  3. BSG-200SeriesAJA

    The AJA BSG-200 Series is a substrate holder for wafers or similar planar substrates up to 200 mm in diameter with direct backside gas cooling while rotating.

    CategorySubstrate holderWafer200mm
  4. 9856 IRCAJA

    The AJA 9856 IRC is a sputtering system from AJA, categorized as deposition equipment.

    CategoryDeposition
  5. Q2AJA

    The AJA Q2 is a loadlocked UHV sputter deposition system with RF and DC sputtering capability, RF substrate pre-treatment, and an in-chamber ion source for substrate cleaning.

    CategoryDeposition
  6. A300-XPAJA

    The A300-XP is an AJA UHV magnetron sputtering source series described as an expanded-performance version of the A300 series.

    CategoryDeposition
  7. BSG-200AJA

    The AJA BSG-200 Series Substrate Holder is a backside-gas-cooled rotating substrate holder for wafers or similar planar substrates up to 200 mm in diameter.

    CategorySubstrate holderWafer200mm
  8. TR5313AJA

    The AJA TR5313 is a triangular magnetron sputtering source designed to optimize deposition uniformity onto a circle of substrates up to 8 inches in diameter.

    CategoryDepositionWaferup to 8-inch diameter substrates
  9. A300AJA

    AJA A300 is an A300 Series modular magnetron sputtering source used in Orion-series sputtering systems.

    CategoryDepositionWaferup to 6 in diameter
  10. ATC 2036 EAJA

    The AJA ATC 2036 E is an evaporator with a 15-20 inch adjustable source-to-wafer length.

    CategoryDepositionWafer15-20” adjustable length from source to wafer
  11. ATC 1500 FAJA

    The AJA ATC 1500 F is a sputter coater with substrate size up to 3 inches.

    CategoryDeposition
  12. CT1210AJA

    The AJA CT1210 is a cylindrical target magnetron used for 3D sputtering where substrates are immersed into the target/cathode.

    CategoryDeposition
  13. SBE-6AJA

    The AJA SBE-6 is a Sputter Beam Epitaxy deposition system that combines sputtering with deposition quality described as rivaling molecular beam epitaxy.

    CategoryDeposition
  14. NT-80AJA

    The AJA NT-80 is a Nautilus Series rotating magnetron with a configurable magnet array for optimizing target utilization, uniformity, or intentional non-uniformity.

    CategoryDeposition
  15. 300AJA

    The AJA 300 is a 300 amp water cooled thermal evaporation source used in AJA thermal evaporation systems.

    CategoryDeposition
  16. A3CVAJA

    The AJA A3CV is a magnetron sputtering source line with a common source head subassembly that accepts multiple target modules and is offered in HV and UHV mounting versions.

    CategoryDeposition