Lam Research
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The Lam Research OnTrak Synergy Post is a post-CMP cleaner. The OnTrak Synergy Post is an 8-inch wafer cleaning system. The OnTrak Synergy Post includes a HEPA mini-environment.[1][2][3]
A post-CMP cleaner removes residual slurry and other surface contamination after chemical mechanical planarization.
A CMP cleaner is typically placed in a controlled enclosure that helps limit airborne particle exposure during wafer handling and cleaning.
The OnTrak Synergy Post CMP sits after chemical mechanical planarization and before later wafer process steps that follow surface cleanup.
The cleaner is used at the point where wafers need post-polish cleaning rather than planarization itself.
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The following facts about the OnTrak Synergy Post are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the OnTrak Synergy Post are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the OnTrak Synergy Post are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the OnTrak Synergy Post are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the OnTrak Synergy Post are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the OnTrak Synergy Post is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 11, 2026.
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